References Behind Three Pulses for Excessive Miniaturization

Last week’s subscription giveaway riddle refers to ASML’s innovation within EUV Lithography and Key and Peele’s Excessive Celebration skit.

Read the digest here.

We featured Veritasium’s The Ridiculous Engineering Of The World’s Most Important Machine video about ASML and how they developed EUV where they described using three pulses to create more EUV light for “basically the same power coming from the drive laser.” Additionally, EUV continues to make semiconductors excessively miniature as they progress from foundational 7nm and 5nm nodes toward the sub-2nm regime and the emerging 18A and 14A (Angstrom) milestones.

The cultural reference comes from Key and Peele’s comedy skit where “a referee at a Rhinos game refuses to give Hingle McCringleberry a break when it comes to ruling his latest touchdown celebration excessive.” Earlier this year running back Rico Dowdle brought back the celebration to the dismay of the NFL.

Rico. Man, you got robbed. You only did two pumps,” Key said. “I’m sorry, man. Now I’m going to have to write a new sketch.